Description

Chemical vapor deposition furnace (CVD furnace) is a device used to heat and gasify reaction sources such as metal halides, metal organics, and hydrocarbons under a specific pressure, and then react to produce solid deposits on the surface of the target material. It is widely used in material purification, new crystal development, deposition of various single crystals, polycrystalline or glassy inorganic thin film materials. The designed iron-based nano-catalytic particles operate at a high temperature of 900-1100 °C and a certain vacuum pressure, and are fed with carbon source gases such as acetylene, methane, and natural gas to control the flow direction of the gas and the residence time in the reactor. Obtain high-quality carbon nanotubes with controllable diameter and length.

Application

The designed iron-based nano-catalytic particles operate at a high temperature of 900-1100 °C and a certain vacuum pressure, and are fed with carbon source gases such as acetylene, methane, and natural gas to control the flow direction of the gas and the residence time in the reactor. Obtain high-quality carbon nanotubes with controllable diameter and length.

Features

• It can accurately control the gas flow and pressure, the deposition gas flow in the furnace is stable, and the pressure fluctuation range is small.

• Multi-channel deposition gas path, uniform flow field, no dead corners of deposition, and good deposition effect.

• Effective treatment of highly corrosive exhaust gas, flammable and explosive gas, solid dust and low melting point viscous products produced by deposition.

• Using anti-corrosion vacuum unit, long continuous working time and low maintenance rate.

• Vertical Bottom Loading with a single chamber or multi chambers design for high production capacity. The shell and door are water-cooled jacketed. Both the outer and inner layer of the furnace shell and door is made of SUS304 stainless steel.

Technical Parameters